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Etch damage evaluation on (Bi4−xLax)Ti3O12 thin films during the etch process using inductively coupled plasma sources
Jong-Gyu Kim, Gwan-Ha Kim, Kyoung-Tae Kim, Chang-Il KimVolume:
9
Year:
2006
Language:
english
Pages:
7
DOI:
10.1016/j.mssp.2006.10.034
File:
PDF, 632 KB
english, 2006