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Silicate formation at the interface of Hf-oxide as a high-k dielectrics and Si(0 0 1) surfaces
D. Schmeißer, E. ZschechVolume:
9
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.mssp.2006.10.046
File:
PDF, 215 KB
english, 2006