Al-oxynitrides as a buffer layer for Pr2O3/SiC interfaces

Materials Science in Semiconductor Processing 2006 Vol. 9; Iss. 6

Al-oxynitrides as a buffer layer for Pr2O3/SiC interfaces

Rakesh Sohal, Mohamed Torche, Karsten Henkel, Patrick Hoffmann, Massimo Tallarida, Dieter Schmeißer
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Volume:
9
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.mssp.2006.10.047
File:
PDF, 234 KB
english, 2006
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