Implant Isolation of Silicon Two-Dimensional Electron Gases...

IEEE Electron Device Letters 2013 / 01 Vol. 34; Iss. 1

Implant Isolation of Silicon Two-Dimensional Electron Gases at 4.2 K

Huang, Chiao-Ti, Li, Jiun-Yun, Sturm, James C.
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Volume:
34
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2012.2228160
Date:
January, 2013
File:
PDF, 301 KB
english, 2013
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