Voltage scaling of ferroelectric thin films deposited by...

Integrated Ferroelectrics 1999 / 10 Vol. 26; Iss. 1-4

Voltage scaling of ferroelectric thin films deposited by CVD

Bilodeau, Steven M., Johnston, Stephen T., Russell, Michael W., Vestyck, Daniel J., Buskirk, Peter C. Van
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Volume:
26
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584589908215617
Date:
October, 1999
File:
PDF, 524 KB
english, 1999
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