Electron and hole trapping in doped oxides

IEEE Transactions on Nuclear Science 1995 / Dec. Vol. 42; Iss. 6

Electron and hole trapping in doped oxides

Warren, W.L., Shaneyfelt, M.R., Fleetwood, D.M., Winokur, P.S., Montague, S.
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Volume:
42
Language:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/23.488772
Date:
January, 1995
File:
PDF, 925 KB
english, 1995
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