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Radiation hardened micron and submicron MOSFETs containing fluorinated oxides
Nishioka, Y., Ohyu, K., Ohji, Y., Kato, M., da Silva, E.F., Ma, T.P.Volume:
36
Language:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/23.45413
Date:
January, 1989
File:
PDF, 686 KB
english, 1989