Limitations of shift-and-ratio based L/sub eff/ extraction...

IEEE Electron Device Letters 2000 / 03 Vol. 21; Iss. 3

Limitations of shift-and-ratio based L/sub eff/ extraction techniques for MOS transistors with halo or pocket implants

van Meer, H., Henson, K., Lyu, J.-H., Rosmeulen, M., Kubicek, S., Collaert, N., De Meyer, K.
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Volume:
21
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.823579
Date:
March, 2000
File:
PDF, 128 KB
english, 2000
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