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Post-soft-breakdown characteristics of deep submicron NMOSFETs with ultrathin gate oxide
Min-Yu Tsai,, Horng-Chih Lin,, Da-Yuan Lee,, Tiao-Yuan Huang,Volume:
22
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.930687
Date:
July, 2001
File:
PDF, 58 KB
english, 2001