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A comparison between SIMS and spreading resistance profiles for ion implanted arsenic and boron after heat treatments in an inert ambient
DJ Godfrey, RD Groves, MG Dowsett, AFW WilloughbyVolume:
129
Year:
1985
Pages:
6
DOI:
10.1016/0378-4363(85)90565-0
File:
PDF, 287 KB
1985