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Rapid thermal processing for simultaneous annealing of shallow implanted junctions and formation of their TiSi2 contacts
K. Maex, R.F. De KeersmaeckerVolume:
129
Year:
1985
Language:
english
Pages:
5
DOI:
10.1016/0378-4363(85)90567-4
File:
PDF, 468 KB
english, 1985