TiW silicide-gate technology for self-aligned GaAs FET

TiW silicide-gate technology for self-aligned GaAs FET

SS Gill, GJ Pryce, J Woodward
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Volume:
129
Year:
1985
Language:
english
Pages:
5
DOI:
10.1016/0378-4363(85)90617-5
File:
PDF, 269 KB
english, 1985
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