${\rm HfO}_{2}$ Based High-$k$ Inter-Gate Dielectrics for...

IEEE Electron Device Letters 2014 / 01 Vol. 35; Iss. 1

${\rm HfO}_{2}$ Based High-$k$ Inter-Gate Dielectrics for Planar NAND Flash Memory

Breuil, Laurent, Lisoni, Judit G., Blomme, Pieter, Van den Bosch, Geert, Van Houdt, Jan
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Volume:
35
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2013.2290053
Date:
January, 2014
File:
PDF, 549 KB
english, 2014
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