Growth of in situ doped silicon epitaxial layer by rapid...

Growth of in situ doped silicon epitaxial layer by rapid thermal processing

Lee, S. K., Ku, Y. H., Hsieh, T. Y., Jung, K. H., Kwong, D. L., Spratt, David, Chu, P.

How much do you like this book?

What’s the quality of the file?

Download the book for quality assessment

What’s the quality of the downloaded files?

Volume:

Year:

1990

Language:

english

Journal:

Applied Physics Letters

DOI:

10.1063/1.104069

File:

PDF, 575 KB

english, 1990

Conversion to is in progress

Conversion to is failed