Silicon deposited by low pressure chemical vapour deposition from Si2H6: experiments, modelling and properties
E. Scheid, J.J. Pedroviejo, P. Duverneuil, M. Gueye, J. Samitier, A. El Hassani, D. Bielle-DaspetVolume:
17
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0921-5107(93)90082-x
File:
PDF, 444 KB
english, 1993