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Chemical reactivity and gas flow dynamics considerations on atmospheric pressure chemical vapor deposition with silane precursor
G. Jursich, K. Mulderink, W. Von DrasekVolume:
17
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0921-5107(93)90083-y
File:
PDF, 502 KB
english, 1993