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A new metal-organic chemical vapor deposition process for selective copper metallization
J.A.T. Norman, B.A. Muratore, P.N. Dyer, D.A. Roberts, A.K. Hochberg, L.H. DuboisVolume:
17
Year:
1993
Language:
english
Pages:
6
DOI:
10.1016/0921-5107(93)90085-2
File:
PDF, 528 KB
english, 1993