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A model for low pressure chemical vapor deposition in a hot-wall tubular reactor
W.G. Houf, J.F. Grcar, W.G. BreilandVolume:
17
Year:
1993
Language:
english
Pages:
9
DOI:
10.1016/0921-5107(93)90100-2
File:
PDF, 827 KB
english, 1993