![](/img/cover-not-exists.png)
Silicon nitride elaborated by low pressure chemical vapour deposition from Si2H6 and NH3 at low temperature
E. Scheid, L.K. Kouassi, R. Henda, J. Samitier, J.R. MoranteVolume:
17
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0921-5107(93)90103-t
File:
PDF, 426 KB
english, 1993