Electron-beam-induced current and atomic force microscopy...

Electron-beam-induced current and atomic force microscopy studies on silicon etch steps created by reactive ion etching and reactive ion beam etching

G. Jäger-Waldau, H.-U. Habermeier, G. Zwicker, E. Bucher
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Volume:
24
Year:
1994
Language:
english
Pages:
3
DOI:
10.1016/0921-5107(94)90332-8
File:
PDF, 278 KB
english, 1994
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