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Effect of chelating agent on benzotriazole removal during post copper chemical mechanical polishing cleaning
Miao, Yingxin, Wang, Shengli, Wang, Chenwei, Liu, Yuling, Sun, Mingbin, Chen, YangVolume:
130
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2014.08.012
Date:
November, 2014
File:
PDF, 1.41 MB
english, 2014