Silicon epitaxial growth on GaAs using a rapid thermal chemical vapor deposition process
Nissim, Y. I., Sapriel, J., Gao, Y., d’Anterroches, C., Regolini, J. L., Bensahel, D.Volume:
59
Year:
1991
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.105383
File:
PDF, 655 KB
english, 1991