Deposition parameters and film properties of hydrogenated...

Deposition parameters and film properties of hydrogenated amorphous silicon prepared by high rate dc planar magnetron reactive sputtering

Savvides, N.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
55
Year:
1984
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.333024
File:
PDF, 768 KB
english, 1984
Conversion to is in progress
Conversion to is failed