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Electrical activity of aluminum implanted in silicon: An interface problem in high-power devices
Brüesch, P., Halder, E., Kluge, P., Rhyner, J., Roggwiller, P., Stockmeier, Th., Stucki, F., Wiesmann, H. J.Volume:
68
Year:
1990
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.346526
File:
PDF, 1.28 MB
english, 1990