Formation of thin films of NiSi: Metastable structure, diffusion mechanisms in intermetallic compounds
d’Heurle, F., Petersson, C. S., Baglin, J. E. E., La Placa, S. J., Wong, C. Y.Volume:
55
Year:
1984
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.333021
File:
PDF, 1.08 MB
english, 1984