Sub-50 nm high aspect-ratio silicon pillars, ridges, and trenches fabricated using ultrahigh resolution electron beam lithography and reactive ion etching
Fischer, P. B., Chou, S. Y.Volume:
62
Year:
1993
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.108696
File:
PDF, 606 KB
english, 1993