X-ray photoelectron spectroscopic study of rapid thermal...

Applied Physics Letters 1989 Vol. 54; Iss. 25

X-ray photoelectron spectroscopic study of rapid thermal processing on SiO2/GaAs

Katayama, Masayuki, Tokuda, Yutaka, Ando, Nobuo, Inoue, Yajiro, Usami, Akira, Wada, Takao
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Volume:
54
Year:
1989
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.101544
File:
PDF, 510 KB
english, 1989
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