Key measurements of ultrathin gate dielectric reliability...

IBM Journal of Research and Development 1999 / 05 Vol. 43; Iss. 3

Key measurements of ultrathin gate dielectric reliability and in-line monitoring

Abadeer, W. W., Bagramian, A., Conkle, D. W., Griffin, C. W., Langlois, E., Lloyd, B. F., Mallette, R. P., Massucco, J. E., McKenna, J. M., Mittl, S. W., Noel, P. H.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
43
Language:
english
Journal:
IBM Journal of Research and Development
DOI:
10.1147/rd.433.0407
Date:
May, 1999
File:
PDF, 445 KB
english, 1999
Conversion to is in progress
Conversion to is failed