Effect of pulse parameters on the deposition rate of hydrogenated amorphous silicon in a modified pulsed plasma discharge
Anandan, C., Mukherjee, C., Seth, Tanay, Dixit, P. N., Bhattacharyya, R.Volume:
66
Year:
1995
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.114154
File:
PDF, 247 KB
english, 1995