An interface reaction mechanism for the dry oxidation of...

Journal of Applied Physics 1989 Vol. 65; Iss. 5

An interface reaction mechanism for the dry oxidation of silicon

Moharir, S. S., Chandorkar, A. N., Vasi, J.
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Volume:
65
Year:
1989
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.342850
File:
PDF, 598 KB
english, 1989
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