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Amorphous silicon produced by ion implantation: Effects of ion mass and thermal annealing
Waddell, C. N., Spitzer, W. G., Fredrickson, J. E., Hubler, G. K., Kennedy, T. A.Volume:
55
Year:
1984
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.333004
File:
PDF, 695 KB
english, 1984