X-ray photoelectron spectroscopy analysis of photostimulated chemical vapor deposition hydrogenated amorphous silicon/amorphous aluminum oxide
Uwasawa, K., Ishihara, F., Matsumoto, S.Volume:
60
Year:
1992
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.107407
File:
PDF, 605 KB
english, 1992