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X-ray photoelectron spectroscopy analysis of...

X-ray photoelectron spectroscopy analysis of photostimulated chemical vapor deposition hydrogenated amorphous silicon/amorphous aluminum oxide

Uwasawa, K., Ishihara, F., Matsumoto, S.
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Volume:
60
Year:
1992
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.107407
File:
PDF, 605 KB
english, 1992
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