Consideration on the void generation mechanism in...

Consideration on the void generation mechanism in electron-beam recrystallized silicon-on-insulator films

Horita, Susumu, Ishiwara, Hiroshi
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Volume:
65
Year:
1989
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.342875
File:
PDF, 1.08 MB
english, 1989
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