Room-Temperature ALD of Metal Oxide Thin Films by...

Chemical Vapor Deposition 2013 / 06 Vol. 19; Iss. 4-6

Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD

Potts, Stephen E., Profijt, Harald B., Roelofs, Robin, Kessels, Wilhelmus M. M.
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Volume:
19
Language:
english
Journal:
Chemical Vapor Deposition
DOI:
10.1002/cvde.201207033
Date:
June, 2013
File:
PDF, 412 KB
english, 2013
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