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Process stability of ferroelectric PLZT thin film sputtering for FRAM® production
Suu, K., Tani, N., Chu, F., Hickert, G., Hadnagy, T. D., Davenport, T.Volume:
26
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584589908215605
Date:
October, 1999
File:
PDF, 403 KB
english, 1999