Dual-polarity, single-resist mixed (e-beam/photo)...

IEEE Electron Device Letters 1981 / 11 Vol. 2; Iss. 11

Dual-polarity, single-resist mixed (e-beam/photo) lithography

Berker, T.D., Bernacki, S.E.
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Volume:
2
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/edl.1981.25433
Date:
November, 1981
File:
PDF, 575 KB
english, 1981
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