Application of plasma immersion ion implantation doping to...

IEEE Electron Device Letters 1998 / 11 Vol. 19; Iss. 11

Application of plasma immersion ion implantation doping to low-temperature processed poly-Si TFTs

Ching-Fa Yeh,, Tai-Ju Chen,, Chung Liu,, Jiqun Shao,, Cheung, N.W.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
19
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.728903
Date:
November, 1998
File:
PDF, 65 KB
english, 1998
Conversion to is in progress
Conversion to is failed