On the annealing of damage produced by boron ion...

On the annealing of damage produced by boron ion implantation of silicon single crystals

Chadderton, L. T., Eisen, F. H.
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Volume:
7
Language:
english
Journal:
Radiation Effects
DOI:
10.1080/00337577108232573
Date:
January, 1971
File:
PDF, 2.80 MB
english, 1971
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