New low temperature preparation of ferroelectric Bi...

New low temperature preparation of ferroelectric Bi 4 Ti 3 O 12 thin films by MOCVD method

Kijima, Takeshi
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Volume:
26
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584589908215614
Date:
October, 1999
File:
PDF, 447 KB
english, 1999
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