Dependency analysis of line edge roughness in electron-beam...

Microelectronic Engineering 2015 / 02 Vol. 133

Dependency analysis of line edge roughness in electron-beam lithography

Zhao, X., Lee, S.-Y., Choi, J., Lee, S.-H., Shin, I.-K., Jeon, C.-U., Kim, B.-G., Cho, H.-K.
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Volume:
133
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2014.11.017
Date:
February, 2015
File:
PDF, 1.36 MB
english, 2015
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