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Structure analysis of epitaxial Gd2O3/Si(0 0 1) for high-k gate dielectric applications
Tatsuro Watahiki, Bernd Jenichen, Roman Shayduk, Brad P. Tinkham, Wolfgang Braun, Henning RiechertVolume:
311
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.jcrysgro.2008.10.012
File:
PDF, 881 KB
english, 2009