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Effect of hydrogen on passivation quality of SiNx/Si-rich SiNx stacked layers deposited by catalytic chemical vapor deposition on c-Si wafers
Thi, Trinh Cham, Koyama, Koichi, Ohdaira, Keisuke, Matsumura, HidekiVolume:
575
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.10.016
Date:
January, 2015
File:
PDF, 474 KB
english, 2015