Chemical vapour etching of Si, SiGe and Ge with HCl;...

Semiconductor Science and Technology 2005 / 02 Vol. 20; Iss. 2

Chemical vapour etching of Si, SiGe and Ge with HCl; applications to the formation of thin relaxed SiGe buffers and to the revelation of threading dislocations

Bogumilowicz, Y, Hartmann, J M, Truche, R, Campidelli, Y, Rolland, G, Billon, T
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Volume:
20
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/20/2/004
Date:
February, 2005
File:
PDF, 1020 KB
english, 2005
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