Recent progress in metal-organic chemical vapor deposition of $\left( 000\bar{1} \right)$ N-polar group-III nitrides
Keller, Stacia, Li, Haoran, Laurent, Matthew, Hu, Yanling, Pfaff, Nathan, Lu, Jing, Brown, David F, Fichtenbaum, Nicholas A, Speck, James S, DenBaars, Steven P, Mishra, Umesh KVolume:
29
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/29/11/113001
Date:
November, 2014
File:
PDF, 17.12 MB
english, 2014