C-AFM characterization of the dependence of HfAlOx...

Microelectronic Engineering 2004 Vol. 72; Iss. 1-4

C-AFM characterization of the dependence of HfAlOx electrical behavior on post-deposition annealing temperature

X Blasco, J Pétry, M Nafrı́a, X Aymerich, O Richard, W Vandervorst
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Volume:
72
Year:
2004
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2003.12.035
File:
PDF, 284 KB
english, 2004
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