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Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides
Feliciano Giustino, Paolo Umari, Alfredo PasquarelloVolume:
72
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2004.01.011
File:
PDF, 205 KB
english, 2004