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Electron beam lithography for nanometer-scale planar double-gate transistors
W. Weber, G. Ilicali, J. Kretz, L. Dreeskornfeld, W. Rösner, W. Hansch, L. RischVolume:
78-79
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2004.12.028
File:
PDF, 640 KB
english, 2005