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Increased plasma etch resistance of thin polymeric and photoresist films
N. Vourdas, A.G. Boudouvis, E. GogolidesVolume:
78-79
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2004.12.060
File:
PDF, 128 KB
english, 2005