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Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20 nm MOSFET device demonstrators
J. Kretz, L. Dreeskornfeld, G. Ilicali, T. Lutz, W. WeberVolume:
78-79
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2004.12.061
File:
PDF, 275 KB
english, 2005