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Design of low Tg thermosets for short cycle time nanoimprint lithography
F. Reuther, M. Fink, M. Kubenz, C. Schuster, M. Vogler, G. GruetznerVolume:
78-79
Year:
2005
Language:
english
Pages:
7
DOI:
10.1016/j.mee.2004.12.063
File:
PDF, 198 KB
english, 2005